plasma chemical vapor deposition meaning in English
等离子化学气相沉积
等离子体化学汽相淀积
Examples
- The growth of carbon nanotubes at low temperature was studied by thermal chemical vapor deposition and plasma chemical vapor deposition methods
本论文分别以化学气相沉积法及电浆辅助化学气相沉积法探讨于低温下合成奈米碳管。 - Recently mwpcvd ( microwave plasmas chemical vapor deposition ) technique has attracted more and more attentions of the researchers all over the world , it is a new produce technique
近年来微波等离子体化学气相沉积技术越来越受到人们的关注,它是一种新型的生产技术。 - The research introduced a domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and watercooled stainless steel reaction chamber in 2450mhz / 5 kw
详细介绍了自行研制的2450mhz 5kw带有石英玻璃窗、水冷却不锈钢腔体微波等离子体化学气相沉积( mpcvd )装置。 - The research introduced a domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel reaction chamber in 2450mhz / 5 kw
本文详细介绍了自行研制的2450mhz 5kw带有石英玻璃窗、水冷却不锈钢腔体微波等离子体化学气相沉积( mpcvd )装置。 - Microwave plasma chemical vapor deposition ( mpcvd ) , a kind of chemical vapor deposition method with low temperature ， low intensity of pressure and clearance ， is commonly used for the growth of diamond thin films
微波等离子体增强化学气相沉积法（ mpcvd法）是众多低气压下激活cvd工艺方法的一种，也是目前在国内外比较流行的制备金刚石薄膜的工艺方法之一。